STRUCTURAL PROPERTIES OF III-NITRIDES RECEIVED BY UV STIMULATED TECHNOLOGY

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Z. Kushitashvili
LEPL Institute of Micro and Nanoelectronics, Tbilisi, Georgia
A. Bibilashvili
LEPL Institute of Micro and Nanoelectronics, Tbilisi, Georgia
R. Guliaevi
LEPL Institute of Micro and Nanoelectronics, Tbilisi, Georgia
A. Kurtanidze
Ivane Javakhishvili Tbilisi State University, Georgia

Abstract

In terms of structural studies, X-ray diffraction (XRD) studies are discussed in this paper. Based on the experimental results, X-ray diffraction graphs of III nitrides obtained with and without UV irradiation are shown and is evaluated the role of UV stimulation in magnetron sputtering technology.

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Keywords:
2θ degree, intensity, FWHM
Published: Nov 9, 2023

Article Details

Issue
Vol. 12 (2023)
Section
Poster Session (P)
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