STRUCTURAL PROPERTIES OF III-NITRIDES RECEIVED BY UV STIMULATED TECHNOLOGY

Authors

  • Z. Kushitashvili LEPL Institute of Micro and Nanoelectronics, Tbilisi, Georgia
  • A. Bibilashvili LEPL Institute of Micro and Nanoelectronics, Tbilisi, Georgia
  • R. Guliaevi LEPL Institute of Micro and Nanoelectronics, Tbilisi, Georgia
  • A. Kurtanidze Ivane Javakhishvili Tbilisi State University, Georgia

Keywords:

2θ degree, intensity, FWHM

Abstract

In terms of structural studies, X-ray diffraction (XRD) studies are discussed in this paper. Based on the experimental results, X-ray diffraction graphs of III nitrides obtained with and without UV irradiation are shown and is evaluated the role of UV stimulation in magnetron sputtering technology.

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Published

2023-11-09

Issue

Vol. 12 (2023)

Section

Poster Session (P)